Optimizing Deposition Techniques and Parameters for High Tc YBCO Thin Films
DOI:
https://doi.org/10.29070/ryvh6w74Keywords:
Superconducting Thin Films, Deposition Optimization, Magnetron Sputtering, YBCO, Superconducting Transition Temperature (Tc), Critical Current Density (Jc), Thin Film Characterization, SNSPDAbstract
In this research article the goal is to optimise the critical deposition processes and process parameters to form high-quality, superior-properties superconducting thin film. Materials like amorphous MoSi, NbN, TiN and NbTiN are used in a variety of sophisticated superconducting devices, such as superconducting nanowire single photon detectors (SNSPDs). The atomic layer deposition and the ultra-high vacuum magnetron sputtering technique were performed under highly controlled conditions to obtain the thin films. The features of the film formed with each combination of the above parameters were investigated by adjusting each parameter one at a time. The accuracy of thickness and surface topographical characterisation was done by using atomic force microscopy (AFM), structural characterisation by high resolution transmission electron microscopy (HRTEM), surface characterisation of optical properties through variable angle spectroscopic ellipsometry (VASE) and confirmation of the superconducting behaviour was done by using cryogen-free electrical methods. The results show the surfaces are smooth, crystallinity is increased and the defect density is low for optimal deposition parameters. The structural changes improve some properties of the superconductor such as its increased critical current density (Jc), sharper colossal transition and transition temperature (Tc). The observed patterns were confirmed and supported by using statistical analysis (ANOVA, regression). A thorough method for optimising the process parameters is also improved by the study, and there is a good correlation between the deposition parameters and the thin film performance.
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